Improved tangent space based distance metric for accurate lithographic hotspot classification

Jing Guo, Fan Yang, Subarna Sinha, Charles Chiang, Xuan Zeng. Improved tangent space based distance metric for accurate lithographic hotspot classification. In Patrick Groeneveld, Donatella Sciuto, Soha Hassoun, editors, The 49th Annual Design Automation Conference 2012, DAC '12, San Francisco, CA, USA, June 3-7, 2012. pages 1173-1178, ACM, 2012. [doi]

@inproceedings{GuoYSCZ12,
  title = {Improved tangent space based distance metric for accurate lithographic hotspot classification},
  author = {Jing Guo and Fan Yang and Subarna Sinha and Charles Chiang and Xuan Zeng},
  year = {2012},
  doi = {10.1145/2228360.2228577},
  url = {http://doi.acm.org/10.1145/2228360.2228577},
  researchr = {https://researchr.org/publication/GuoYSCZ12},
  cites = {0},
  citedby = {0},
  pages = {1173-1178},
  booktitle = {The 49th Annual Design Automation Conference 2012, DAC '12, San Francisco, CA, USA, June 3-7, 2012},
  editor = {Patrick Groeneveld and Donatella Sciuto and Soha Hassoun},
  publisher = {ACM},
  isbn = {978-1-4503-1199-1},
}