Parallel Simulation of Coupled Oxidation and Diffusion in VLSI Wafer-Fabrication

Matthias G. Hackenberg, Wolfgang Joppich, Slobodan Mijalkovic. Parallel Simulation of Coupled Oxidation and Diffusion in VLSI Wafer-Fabrication. In PARCO. pages 211-215, 1997.

Authors

Matthias G. Hackenberg

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Wolfgang Joppich

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Slobodan Mijalkovic

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