Parallel Simulation of Coupled Oxidation and Diffusion in VLSI Wafer-Fabrication

Matthias G. Hackenberg, Wolfgang Joppich, Slobodan Mijalkovic. Parallel Simulation of Coupled Oxidation and Diffusion in VLSI Wafer-Fabrication. In PARCO. pages 211-215, 1997.

@inproceedings{HackenbergJM97,
  title = {Parallel Simulation of Coupled Oxidation and Diffusion in VLSI Wafer-Fabrication},
  author = {Matthias G. Hackenberg and Wolfgang Joppich and Slobodan Mijalkovic},
  year = {1997},
  researchr = {https://researchr.org/publication/HackenbergJM97},
  cites = {0},
  citedby = {0},
  pages = {211-215},
  booktitle = {PARCO},
}