Enhanced Optimal Multi-Row Detailed Placement for Neighbor Diffusion Effect Mitigation in Sub-10 nm VLSI - researchr publication

researchr

You are not signed in
Sign in
Sign up

ChangHo Han, Andrew B. Kahng, Lutong Wang, Bangqi Xu. Enhanced Optimal Multi-Row Detailed Placement for Neighbor Diffusion Effect Mitigation in Sub-10 nm VLSI. IEEE Trans. on CAD of Integrated Circuits and Systems, 38(9):1703-1716, 2019. [doi]

Abstract is missing.

runs on WebDSL