Study on maximum electric field modeling used for HCI induced degradation characteristic of LDMOS transistors

Masashi Higashino, Hitoshi Aoki, Nobukazu Tsukiji, Masaki Kazumi, Takuya Totsuka, Haruo Kobayashi. Study on maximum electric field modeling used for HCI induced degradation characteristic of LDMOS transistors. In 2015 IEEE 11th International Conference on ASIC, ASICON 2015, Chengdu, China, November 3-6, 2015. pages 1-4, IEEE, 2015. [doi]

Authors

Masashi Higashino

This author has not been identified. Look up 'Masashi Higashino' in Google

Hitoshi Aoki

This author has not been identified. Look up 'Hitoshi Aoki' in Google

Nobukazu Tsukiji

This author has not been identified. Look up 'Nobukazu Tsukiji' in Google

Masaki Kazumi

This author has not been identified. Look up 'Masaki Kazumi' in Google

Takuya Totsuka

This author has not been identified. Look up 'Takuya Totsuka' in Google

Haruo Kobayashi

This author has not been identified. Look up 'Haruo Kobayashi' in Google