Yoshihiko Hirai, Masaru Sasago, Masayuki Endo, K. Tsuji, Yojiro Mano. Process Modeling for Photoresist Development and Design of DLR/sd (Double-Layer Resist by a Single Development) Process. IEEE Trans. on CAD of Integrated Circuits and Systems, 6(3):403-409, 1987. [doi]
Abstract is missing.