A Compact Monitoring Circuit to Accurately Extract Fabrication Deviation in Silicon Waveguides

Tsuyoshi Horikawa, Hideaki Okayama, Yosuke Onawa, Daisuke Shimura, Jun Ushida, Akemi Shiina, Tadashi Murao, Hiroki Yaegashi. A Compact Monitoring Circuit to Accurately Extract Fabrication Deviation in Silicon Waveguides. In European Conference on Optical Communications, ECOC 2020, Virtual Event, Belgium, December 6-10, 2020. pages 1-4, IEEE, 2020. [doi]

@inproceedings{HorikawaOOSUSMY20,
  title = {A Compact Monitoring Circuit to Accurately Extract Fabrication Deviation in Silicon Waveguides},
  author = {Tsuyoshi Horikawa and Hideaki Okayama and Yosuke Onawa and Daisuke Shimura and Jun Ushida and Akemi Shiina and Tadashi Murao and Hiroki Yaegashi},
  year = {2020},
  doi = {10.1109/ECOC48923.2020.9333168},
  url = {https://doi.org/10.1109/ECOC48923.2020.9333168},
  researchr = {https://researchr.org/publication/HorikawaOOSUSMY20},
  cites = {0},
  citedby = {0},
  pages = {1-4},
  booktitle = {European Conference on Optical Communications, ECOC 2020, Virtual Event, Belgium, December 6-10, 2020},
  publisher = {IEEE},
  isbn = {978-1-7281-7361-0},
}