Parallelization of a Monte Carlo ion implantation simulator

Andreas Hössinger, Erasmus Langer, Siegfried Selberherr. Parallelization of a Monte Carlo ion implantation simulator. IEEE Trans. on CAD of Integrated Circuits and Systems, 19(5):560-567, 2000. [doi]

@article{HossingerLS00,
  title = {Parallelization of a Monte Carlo ion implantation simulator},
  author = {Andreas Hössinger and Erasmus Langer and Siegfried Selberherr},
  year = {2000},
  doi = {10.1109/43.845080},
  url = {http://doi.ieeecomputersociety.org/10.1109/43.845080},
  researchr = {https://researchr.org/publication/HossingerLS00},
  cites = {0},
  citedby = {0},
  journal = {IEEE Trans. on CAD of Integrated Circuits and Systems},
  volume = {19},
  number = {5},
  pages = {560-567},
}