The following publications are possibly variants of this publication:
- Monte Carlo simulation of ion implantation into two- and three-dimensional structuresGerhard Hobler, Siegfried Selberherr. tcad, 8(5):450-459, 1989. [doi]
- Monte Carlo simulation of silicon amorphization during ion implantationWalter Bohmayr, Alexander Burenkov, Jürgen Lorenz, Heiner Ryssel, Siegfried Selberherr. tcad, 17(12):1236-1243, 1998. [doi]
- On smoothing three-dimensional Monte Carlo ion implantation simulation resultsClemens Heitzinger, Andreas Hössinger, Siegfried Selberherr. tcad, 22(7):879-883, 2003. [doi]
- An algorithm for smoothing three-dimensional Monte Carlo ion implantation simulation resultsClemens Heitzinger, Andreas Hössinger, Siegfried Selberherr. mcs, 66(2-3):219-230, 2004. [doi]