Monte Carlo simulation of silicon amorphization during ion implantation - researchr publication

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Walter Bohmayr, Alexander Burenkov, Jürgen Lorenz, Heiner Ryssel, Siegfried Selberherr. Monte Carlo simulation of silicon amorphization during ion implantation. IEEE Trans. on CAD of Integrated Circuits and Systems, 17(12):1236-1243, 1998. [doi]

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