Fogging Effect Aware Placement in Electron Beam Lithography

Yu-Chen Huang, Yao-Wen Chang. Fogging Effect Aware Placement in Electron Beam Lithography. In Proceedings of the 54th Annual Design Automation Conference, DAC 2017, Austin, TX, USA, June 18-22, 2017. ACM, 2017. [doi]

Abstract

Abstract is missing.