Integration the back-side inclined exposure technology to fabricate the 45° k-type prism with nanometer roughness - researchr publication authors

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Kuo-Yung Hung, Yi-Wei Tsai, Chun-Fu Lee, Yi-Hao Chu. Integration the back-side inclined exposure technology to fabricate the 45° k-type prism with nanometer roughness. In 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012, Kyoto, Japan, March 5-8, 2012. pages 120-124, IEEE, 2012. [doi]

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