Kuo-Yung Hung, Yi-Wei Tsai, Chun-Fu Lee, Yi-Hao Chu. Integration the back-side inclined exposure technology to fabricate the 45° k-type prism with nanometer roughness. In 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012, Kyoto, Japan, March 5-8, 2012. pages 120-124, IEEE, 2012. [doi]
Abstract is missing.