Kuo-Yung Hung, Yi-Wei Tsai, Chun-Fu Lee, Yi-Hao Chu. Integration the back-side inclined exposure technology to fabricate the 45° k-type prism with nanometer roughness. In 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012, Kyoto, Japan, March 5-8, 2012. pages 120-124, IEEE, 2012. [doi]
@inproceedings{HungTLC12,
title = {Integration the back-side inclined exposure technology to fabricate the 45° k-type prism with nanometer roughness},
author = {Kuo-Yung Hung and Yi-Wei Tsai and Chun-Fu Lee and Yi-Hao Chu},
year = {2012},
doi = {10.1109/NEMS.2012.6196737},
url = {http://dx.doi.org/10.1109/NEMS.2012.6196737},
researchr = {https://researchr.org/publication/HungTLC12},
cites = {0},
citedby = {0},
pages = {120-124},
booktitle = {7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012, Kyoto, Japan, March 5-8, 2012},
publisher = {IEEE},
isbn = {978-1-4673-1122-9},
}