Interactive presentation: Process tolerant beta-ratio modulation for ultra-dynamic voltage scaling

Myeong-Eun Hwang, Tamer Cakici, Kaushik Roy. Interactive presentation: Process tolerant beta-ratio modulation for ultra-dynamic voltage scaling. In Rudy Lauwereins, Jan Madsen, editors, 2007 Design, Automation and Test in Europe Conference and Exposition (DATE 2007), April 16-20, 2007, Nice, France. pages 1550-1555, ACM, 2007. [doi]

Abstract

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