Study of error repeatability and recovery in 40nm TaOx ReRAM

Takashi Inose, Seiichi Aritome, Ryutaro Yasuhara, Satoshi Mishima, Ken Takeuchi. Study of error repeatability and recovery in 40nm TaOx ReRAM. In 47th European Solid-State Device Research Conference, ESSDERC 2017, Leuven, Belgium, September 11-14, 2017. pages 10-13, IEEE, 2017. [doi]

Abstract

Abstract is missing.