Chemical-mechanical polishing aware application-specific 3D NoC design - researchr publication authors

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Wooyoung Jang, Ou He, Jae-Seok Yang, David Z. Pan. Chemical-mechanical polishing aware application-specific 3D NoC design. In 2011 IEEE/ACM International Conference on Computer-Aided Design (ICCAD), San Jose, California, USA, November 7-10, 2011. pages 207-212, IEEE, 2011. [doi]

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