Wooyoung Jang, Ou He, Jae-Seok Yang, David Z. Pan. Chemical-mechanical polishing aware application-specific 3D NoC design. In 2011 IEEE/ACM International Conference on Computer-Aided Design (ICCAD), San Jose, California, USA, November 7-10, 2011. pages 207-212, IEEE, 2011. [doi]
@inproceedings{JangHYP11,
title = {Chemical-mechanical polishing aware application-specific 3D NoC design},
author = {Wooyoung Jang and Ou He and Jae-Seok Yang and David Z. Pan},
year = {2011},
doi = {10.1109/ICCAD.2011.6105327},
url = {http://dx.doi.org/10.1109/ICCAD.2011.6105327},
researchr = {https://researchr.org/publication/JangHYP11},
cites = {0},
citedby = {0},
pages = {207-212},
booktitle = {2011 IEEE/ACM International Conference on Computer-Aided Design (ICCAD), San Jose, California, USA, November 7-10, 2011},
publisher = {IEEE},
isbn = {978-1-4577-1399-6},
}