Sung Jun Jang, Dae Hyun Ka, Chong-Gun Yu, Kwan-Su Kim, Won-Ju Cho, Jong-Tae Park. Comparative study of NBTI as a function of Si film orientation and thickness in SOI pMOSFETs. Microelectronics Reliability, 47(9-11):1411-1415, 2007. [doi]
Abstract is missing.