Chemical-Mechanical Polishing-Aware Application-Specific 3D NoC Design

Wooyoung Jang, David Z. Pan. Chemical-Mechanical Polishing-Aware Application-Specific 3D NoC Design. IEEE Trans. on CAD of Integrated Circuits and Systems, 32(6):940-951, 2013. [doi]

Authors

Wooyoung Jang

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David Z. Pan

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