Wooyoung Jang, David Z. Pan. Chemical-Mechanical Polishing-Aware Application-Specific 3D NoC Design. IEEE Trans. on CAD of Integrated Circuits and Systems, 32(6):940-951, 2013. [doi]
@article{JangP13,
title = {Chemical-Mechanical Polishing-Aware Application-Specific 3D NoC Design},
author = {Wooyoung Jang and David Z. Pan},
year = {2013},
doi = {10.1109/TCAD.2013.2237771},
url = {http://dx.doi.org/10.1109/TCAD.2013.2237771},
researchr = {https://researchr.org/publication/JangP13},
cites = {0},
citedby = {0},
journal = {IEEE Trans. on CAD of Integrated Circuits and Systems},
volume = {32},
number = {6},
pages = {940-951},
}