Delayed interferometer based Si-wire WDM demultiplexers fabricated by phase controllable and productive 300-mm wafer-scale ArF-immersion lithography technology

Seok-Hwan Jeong, Daisuke Shimura, Takasi Simoyama, Tsuyoshi Horikawa, Yu Tanaka, Ken Morito. Delayed interferometer based Si-wire WDM demultiplexers fabricated by phase controllable and productive 300-mm wafer-scale ArF-immersion lithography technology. In Optical Fiber Communications Conference and Exhibition, OFC 2014, San Francisco, CA, USA, March 9-13, 2014. pages 1-3, IEEE, 2014. [doi]

Abstract

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