Characterization and analysis of pattern dependent variation-aware interconnects for a 65nm technology - researchr publication authors

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Lele Jiang, Xiaojing Qin, Lifu Chang, Yuhua Cheng. Characterization and analysis of pattern dependent variation-aware interconnects for a 65nm technology. In 2011 IEEE 9th International Conference on ASIC, ASICON 2011, Xiamen, China, October 25-28, 2011. pages 854-857, IEEE, 2011. [doi]

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