Characterization and analysis of pattern dependent variation-aware interconnects for a 65nm technology

Lele Jiang, Xiaojing Qin, Lifu Chang, Yuhua Cheng. Characterization and analysis of pattern dependent variation-aware interconnects for a 65nm technology. In 2011 IEEE 9th International Conference on ASIC, ASICON 2011, Xiamen, China, October 25-28, 2011. pages 854-857, IEEE, 2011. [doi]

Abstract

Abstract is missing.