Lele Jiang, Xiaojing Qin, Lifu Chang, Yuhua Cheng. Characterization and analysis of pattern dependent variation-aware interconnects for a 65nm technology. In 2011 IEEE 9th International Conference on ASIC, ASICON 2011, Xiamen, China, October 25-28, 2011. pages 854-857, IEEE, 2011. [doi]
@inproceedings{JiangQCC11,
title = {Characterization and analysis of pattern dependent variation-aware interconnects for a 65nm technology},
author = {Lele Jiang and Xiaojing Qin and Lifu Chang and Yuhua Cheng},
year = {2011},
doi = {10.1109/ASICON.2011.6157339},
url = {http://dx.doi.org/10.1109/ASICON.2011.6157339},
researchr = {https://researchr.org/publication/JiangQCC11},
cites = {0},
citedby = {0},
pages = {854-857},
booktitle = {2011 IEEE 9th International Conference on ASIC, ASICON 2011, Xiamen, China, October 25-28, 2011},
publisher = {IEEE},
isbn = {978-1-61284-192-2},
}