Characterization of line edge roughness and line width roughness of nano-scale typical structures

Zhuangde Jiang, Fengxia Zhao, Weixuan Jing, Philip D. Prewett, Kyle Jiang. Characterization of line edge roughness and line width roughness of nano-scale typical structures. In 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2009, Shenzhen, China, January 5-8, 2009. pages 299-303, IEEE, 2009. [doi]

@inproceedings{JiangZJPJ09,
  title = {Characterization of line edge roughness and line width roughness of nano-scale typical structures},
  author = {Zhuangde Jiang and Fengxia Zhao and Weixuan Jing and Philip D. Prewett and Kyle Jiang},
  year = {2009},
  doi = {10.1109/NEMS.2009.5068582},
  url = {http://doi.ieeecomputersociety.org/10.1109/NEMS.2009.5068582},
  researchr = {https://researchr.org/publication/JiangZJPJ09},
  cites = {0},
  citedby = {0},
  pages = {299-303},
  booktitle = {4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2009, Shenzhen, China, January 5-8, 2009},
  publisher = {IEEE},
  isbn = {978-1-4244-4629-2},
}