Analysis and optimization of SRAM robustness for double patterning lithography - researchr publication authors

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Vivek Joshi, Kanak Agarwal, David Blaauw, Dennis Sylvester. Analysis and optimization of SRAM robustness for double patterning lithography. In 2010 International Conference on Computer-Aided Design (ICCAD 10), November 7-11, 2010, San Jose, CA, USA. pages 25-31, IEEE, 2010. [doi]

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