Vivek Joshi, Kanak Agarwal, David Blaauw, Dennis Sylvester. Analysis and optimization of SRAM robustness for double patterning lithography. In 2010 International Conference on Computer-Aided Design (ICCAD 10), November 7-11, 2010, San Jose, CA, USA. pages 25-31, IEEE, 2010. [doi]
@inproceedings{JoshiABS10,
title = {Analysis and optimization of SRAM robustness for double patterning lithography},
author = {Vivek Joshi and Kanak Agarwal and David Blaauw and Dennis Sylvester},
year = {2010},
doi = {10.1109/ICCAD.2010.5654105},
url = {http://dx.doi.org/10.1109/ICCAD.2010.5654105},
tags = {optimization, analysis},
researchr = {https://researchr.org/publication/JoshiABS10},
cites = {0},
citedby = {0},
pages = {25-31},
booktitle = {2010 International Conference on Computer-Aided Design (ICCAD 10), November 7-11, 2010, San Jose, CA, USA},
publisher = {IEEE},
}