Modeling and analysis of open defect in through silicon via (TSV) channel

Daniel H. Jung, Heegon Kim, Jonghoon J. Kim, Joungho Kim, Hyun-Cheol Bae, Kwang-Seong Choi. Modeling and analysis of open defect in through silicon via (TSV) channel. In 9th International Workshop on Electromagnetic Compatibility of Integrated Circuits, EMC Compo 2013, Nara, Japan, December 15-18, 2013. pages 163-166, IEEE, 2013. [doi]

Abstract

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