Gate oxide breakdown in FET devices and circuits: From nanoscale physics to system-level reliability

Ben Kaczer, Robin Degraeve, Philippe Roussel, Guido Groeseneken. Gate oxide breakdown in FET devices and circuits: From nanoscale physics to system-level reliability. Microelectronics Reliability, 47(4-5):559-566, 2007. [doi]

@article{KaczerDRG07,
  title = {Gate oxide breakdown in FET devices and circuits: From nanoscale physics to system-level reliability},
  author = {Ben Kaczer and Robin Degraeve and Philippe Roussel and Guido Groeseneken},
  year = {2007},
  doi = {10.1016/j.microrel.2007.01.063},
  url = {http://dx.doi.org/10.1016/j.microrel.2007.01.063},
  tags = {reliability},
  researchr = {https://researchr.org/publication/KaczerDRG07},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {47},
  number = {4-5},
  pages = {559-566},
}