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Stochastic Modeling and Local CD Uniformity Comparison between Negative Metal-Based, Negative- and Positive-Tone Development EUV Resists

Itaru Kamohara, Ulrich Welling, Ulrich Klostermann, Wolfgang Demmerle. Stochastic Modeling and Local CD Uniformity Comparison between Negative Metal-Based, Negative- and Positive-Tone Development EUV Resists. IEICE Trans. Electron., 105-C(1):35-46, 2022. [doi]

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Itaru Kamohara

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Ulrich Welling

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Ulrich Klostermann

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Wolfgang Demmerle

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