Stochastic Modeling and Local CD Uniformity Comparison between Negative Metal-Based, Negative- and Positive-Tone Development EUV Resists

Itaru Kamohara, Ulrich Welling, Ulrich Klostermann, Wolfgang Demmerle. Stochastic Modeling and Local CD Uniformity Comparison between Negative Metal-Based, Negative- and Positive-Tone Development EUV Resists. IEICE Trans. Electron., 105-C(1):35-46, 2022. [doi]

@article{KamoharaWKD22,
  title = {Stochastic Modeling and Local CD Uniformity Comparison between Negative Metal-Based, Negative- and Positive-Tone Development EUV Resists},
  author = {Itaru Kamohara and Ulrich Welling and Ulrich Klostermann and Wolfgang Demmerle},
  year = {2022},
  doi = {10.1587/transele.2021ecp5010},
  url = {https://doi.org/10.1587/transele.2021ecp5010},
  researchr = {https://researchr.org/publication/KamoharaWKD22},
  cites = {0},
  citedby = {0},
  journal = {IEICE Trans. Electron.},
  volume = {105-C},
  number = {1},
  pages = {35-46},
}