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Stochastic Modeling and Local CD Uniformity Comparison between Negative Metal-Based, Negative- and Positive-Tone Development EUV Resists

Itaru Kamohara, Ulrich Welling, Ulrich Klostermann, Wolfgang Demmerle. Stochastic Modeling and Local CD Uniformity Comparison between Negative Metal-Based, Negative- and Positive-Tone Development EUV Resists. IEICE Trans. Electron., 105-C(1):35-46, 2022. [doi]

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