Vidya Kaushik, Martine Claes, Annelies Delabie, Sven Van Elshocht, Olivier Richard, Thierry Conard, Erika Rohr, Thomas Witters, Matty Caymax, Stefan De Gendt. Observation and characterization of defects in HfO::2:: high-K gate dielectric layers. Microelectronics Reliability, 45(5-6):798-801, 2005. [doi]
Abstract is missing.