Noritaka Kawasegi, Noboru Morita, Shigeru Yamada, Noboru Takano, Tatsuo Oyama, Kiwamu Ashida, Jun Taniguchi, Iwao Miyamoto, Sadao Momota. Etching characteristics of a silicon surface induced by focused ion beam irradiation. IJMTM, 9(1/2):34-50, 2006. [doi]
Abstract is missing.