Pre-O2 treatment for LNA gate oxide leakage improvement

Zheng Ke, Sachin Goyal, Solomon Arputharaj, Wendy Wee Yee Lau, Tan Tam Lyn, Lim Dau Fatt, Pandurangan Madhavan, Chandrasekar Venkataramani. Pre-O2 treatment for LNA gate oxide leakage improvement. In IEEE International Reliability Physics Symposium, IRPS 2022, Dallas, TX, USA, March 27-31, 2022. pages 39-1, IEEE, 2022. [doi]

Abstract

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