Understanding of slow traps generation in plasma oxidation GeOx/Ge MOS interfaces with ALD high-k layers

Mengnan Ke, Mitsuru Takenaka, Shinichi Takagi. Understanding of slow traps generation in plasma oxidation GeOx/Ge MOS interfaces with ALD high-k layers. In 47th European Solid-State Device Research Conference, ESSDERC 2017, Leuven, Belgium, September 11-14, 2017. pages 296-299, IEEE, 2017. [doi]

Abstract

Abstract is missing.