C. Kendrick, M. Cook, J. P. Gambino, T. Myers, J. Slezak, T. Hirano, T. Sano, Y. Watanabe, K. Ozeki. Polysilicon resistor stability under voltage stress for safe-operating area characterization. In IEEE International Reliability Physics Symposium, IRPS 2018, Burlingame, CA, USA, March 11-15, 2018. pages 4-1, IEEE, 2018. [doi]
@inproceedings{KendrickCGMSHSW18,
title = {Polysilicon resistor stability under voltage stress for safe-operating area characterization},
author = {C. Kendrick and M. Cook and J. P. Gambino and T. Myers and J. Slezak and T. Hirano and T. Sano and Y. Watanabe and K. Ozeki},
year = {2018},
doi = {10.1109/IRPS.2018.8353686},
url = {https://doi.org/10.1109/IRPS.2018.8353686},
researchr = {https://researchr.org/publication/KendrickCGMSHSW18},
cites = {0},
citedby = {0},
pages = {4},
booktitle = {IEEE International Reliability Physics Symposium, IRPS 2018, Burlingame, CA, USA, March 11-15, 2018},
publisher = {IEEE},
isbn = {978-1-5386-5479-8},
}