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Double-side exposure UV-LED CNC lithography for fine 3D microfabrication

Jungkwun Kim, Yong-Kyu Yoon, Mark G. Allen. Double-side exposure UV-LED CNC lithography for fine 3D microfabrication. In 12th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2017, Los Angeles, CA, USA, April 9-12, 2017. pages 463-466, IEEE, 2017. [doi]

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Jungkwun Kim

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Yong-Kyu Yoon

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Mark G. Allen

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