Jungkwun Kim, Yong-Kyu Yoon, Mark G. Allen. Double-side exposure UV-LED CNC lithography for fine 3D microfabrication. In 12th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2017, Los Angeles, CA, USA, April 9-12, 2017. pages 463-466, IEEE, 2017. [doi]
@inproceedings{KimYA17-0,
title = {Double-side exposure UV-LED CNC lithography for fine 3D microfabrication},
author = {Jungkwun Kim and Yong-Kyu Yoon and Mark G. Allen},
year = {2017},
doi = {10.1109/NEMS.2017.8017065},
url = {https://doi.org/10.1109/NEMS.2017.8017065},
researchr = {https://researchr.org/publication/KimYA17-0},
cites = {0},
citedby = {0},
pages = {463-466},
booktitle = {12th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2017, Los Angeles, CA, USA, April 9-12, 2017},
publisher = {IEEE},
isbn = {978-1-5090-3059-0},
}