Hideki Kitada, Hiroko Tashiro, Shoichi Miyahara, Takeshi Ishitsuka, Aki Dote, Shinji Tadaki, Tatsumi Nakada, Seiki Sakuyama. Study of MOSFET thermal stability with TSV in operation temperature using novel 3D-LSI stress analysis. In 2016 IEEE International 3D Systems Integration Conference, 3DIC 2016, San Francisco, CA, USA, November 8-11, 2016. pages 1-4, IEEE, 2016. [doi]
Abstract is missing.