Ultrathin Gate Dielectric Enabled by Nanofog Aluminum Oxide on Monolayer MoS2

Jung-Soo Ko, Zichen Zhang, Sol Lee, Marc Jaikissoon, Robert K. A. Bennett, Kwanpyo Kim, Andrew C. Kummel, Prabhakar Bandaru, Eric Pop, Krishna C. Saraswat. Ultrathin Gate Dielectric Enabled by Nanofog Aluminum Oxide on Monolayer MoS2. In 53rd IEEE European Solid-State Device Research Conference, ESSDERC 2023, Lisbon, Portugal, September 11-14, 2023. pages 1-4, IEEE, 2023. [doi]

@inproceedings{KoZLJBKKBPS23,
  title = {Ultrathin Gate Dielectric Enabled by Nanofog Aluminum Oxide on Monolayer MoS2},
  author = {Jung-Soo Ko and Zichen Zhang and Sol Lee and Marc Jaikissoon and Robert K. A. Bennett and Kwanpyo Kim and Andrew C. Kummel and Prabhakar Bandaru and Eric Pop and Krishna C. Saraswat},
  year = {2023},
  doi = {10.1109/ESSDERC59256.2023.10268527},
  url = {https://doi.org/10.1109/ESSDERC59256.2023.10268527},
  researchr = {https://researchr.org/publication/KoZLJBKKBPS23},
  cites = {0},
  citedby = {0},
  pages = {1-4},
  booktitle = {53rd IEEE European Solid-State Device Research Conference, ESSDERC 2023, Lisbon, Portugal, September 11-14, 2023},
  publisher = {IEEE},
  isbn = {979-8-3503-0423-7},
}