Chandrasekharan Kothandaraman, X. Chen, Dan Moy, D. Lea, Sami Rosenblatt, F. Khan, D. Leu, Toshiaki Kirihata, D. Ioannou, G. La Rosa, J. B. Johnson, Norman Robson, Subramanian S. Iyer. Oxygen vacancy traps in Hi-K/Metal gate technologies and their potential for embedded memory applications. In IEEE International Reliability Physics Symposium, IRPS 2015, Monterey, CA, USA, April 19-23, 2015. pages 2, IEEE, 2015. [doi]
Abstract is missing.