Analysis of instability line width and white wall created by the photolithography process

Yang-Kuao Kuo, Chuen-Guang Chao, Chi-Yuan Lin. Analysis of instability line width and white wall created by the photolithography process. Microelectronics Journal, 35(11):915-922, 2004. [doi]

Authors

Yang-Kuao Kuo

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Chuen-Guang Chao

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Chi-Yuan Lin

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