Yang-Kuao Kuo, Chuen-Guang Chao, Chi-Yuan Lin. Analysis of instability line width and white wall created by the photolithography process. Microelectronics Journal, 35(11):915-922, 2004. [doi]
@article{KuoCL04,
title = {Analysis of instability line width and white wall created by the photolithography process},
author = {Yang-Kuao Kuo and Chuen-Guang Chao and Chi-Yuan Lin},
year = {2004},
doi = {10.1016/j.mejo.2004.06.023},
url = {http://dx.doi.org/10.1016/j.mejo.2004.06.023},
tags = {analysis},
researchr = {https://researchr.org/publication/KuoCL04},
cites = {0},
citedby = {0},
journal = {Microelectronics Journal},
volume = {35},
number = {11},
pages = {915-922},
}