Rihito Kuroda, Akinobu Teramoto, Kazufumi Watanabe, Michihiko Mifuji, Takahisa Yamaha, Shigetoshi Sugawa, Tadahiro Ohmi. Circuit level prediction of device performance degradation due to negative bias temperature stress. Microelectronics Reliability, 47(6):930-936, 2007. [doi]
@article{KurodaTWMYSO07,
title = {Circuit level prediction of device performance degradation due to negative bias temperature stress},
author = {Rihito Kuroda and Akinobu Teramoto and Kazufumi Watanabe and Michihiko Mifuji and Takahisa Yamaha and Shigetoshi Sugawa and Tadahiro Ohmi},
year = {2007},
doi = {10.1016/j.microrel.2006.06.013},
url = {http://dx.doi.org/10.1016/j.microrel.2006.06.013},
researchr = {https://researchr.org/publication/KurodaTWMYSO07},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {47},
number = {6},
pages = {930-936},
}