Micromachined high-Q inductors in 0.18 μm Cu interconnect low-K CMOS - researchr publication

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Hasnain Lakdawala, Xu Zhu, Hao Luo, Suresh Santhanam, L. Rick Carley, Gary K. Fedder. Micromachined high-Q inductors in 0.18 μm Cu interconnect low-K CMOS. In Proceedings of the IEEE 2001 Custom Integrated Circuits Conference, CICC 2001, San Diego, CA, USA, May 6-9, 2001. pages 579-582, IEEE, 2001. [doi]

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