Jaehun Lee, Youngcheon Jeong, Kyongsik Yeom, Changmin Jeon, Jongsung Woo, Sangjin Lee, Ga Young Lee, Dong-Hwee Hwang, Yong Seok Chung, Minji Seo, Dong-hyun Kim, DalHwan Kim, Yongsik Kim, HyunChang Lee, Soomin Cho, Myeonghee Oh, Hyun-Jin Shin, Gun Rae Kim, Sungyoung Yoon, Yong Kyu Lee, Young-Ki Hong. Highly Reliable 28nm Embedded Flash Process Development for High-Density and High-Speed Automotive Grade-1 Application. In IEEE International Memory Workshop, IMW 2021, Dresden, Germany, May 16-19, 2021. pages 1-3, IEEE, 2021. [doi]
@inproceedings{LeeJYJWLLHCSKKK21,
title = {Highly Reliable 28nm Embedded Flash Process Development for High-Density and High-Speed Automotive Grade-1 Application},
author = {Jaehun Lee and Youngcheon Jeong and Kyongsik Yeom and Changmin Jeon and Jongsung Woo and Sangjin Lee and Ga Young Lee and Dong-Hwee Hwang and Yong Seok Chung and Minji Seo and Dong-hyun Kim and DalHwan Kim and Yongsik Kim and HyunChang Lee and Soomin Cho and Myeonghee Oh and Hyun-Jin Shin and Gun Rae Kim and Sungyoung Yoon and Yong Kyu Lee and Young-Ki Hong},
year = {2021},
doi = {10.1109/IMW51353.2021.9439602},
url = {https://doi.org/10.1109/IMW51353.2021.9439602},
researchr = {https://researchr.org/publication/LeeJYJWLLHCSKKK21},
cites = {0},
citedby = {0},
pages = {1-3},
booktitle = {IEEE International Memory Workshop, IMW 2021, Dresden, Germany, May 16-19, 2021},
publisher = {IEEE},
isbn = {978-1-7281-8517-0},
}