N. H. Lee, S. Lee, S. H. Kim, G. J. Kim, K. W. Lee, Y. S. Lee, Y. C. Hwang, H. S. Kim, S. Pae. Transistor Reliability Characterization for Advanced DRAM with HK+MG & EUV process technology. In IEEE International Reliability Physics Symposium, IRPS 2022, Dallas, TX, USA, March 27-31, 2022. pages 6, IEEE, 2022. [doi]
Abstract is missing.