Failure analysis of integrated circuits beyond the diffraction limit: contact mode near-field scanning optical microscopy with integrated resistance, capacitance, and UV confocal imaging

Aaron Lewis, Efim Shambrot, Anna Radko, Klony Lieberman, Solomon Ezekiel, Dimitry Veinger, Gila Yampolski. Failure analysis of integrated circuits beyond the diffraction limit: contact mode near-field scanning optical microscopy with integrated resistance, capacitance, and UV confocal imaging. Proceedings of the IEEE, 88(9):1471-1479, 2000. [doi]

Abstract

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